Due to its IR-SLD light source and a specially modified optical setup, the FRT CWL HR delivers the highest lateral resolution and the smallest measuring spot of all CWL sensors. It works by the principle of chromatic aberration. This non-destructive method works equally reliable on surfaces with high and low reflectivity. The CWL HR is used for the characterization of structure sizes in the lateral micrometer and vertical sub-micrometer range. Typical applications are found in the semiconductor, MEMS and nanotechnology industries.

• Optical, non-contact, non-destructive measurement
• Sub-µm lateral resolution, very small measuring spot
• High numerical aperture for the measurement of steep flanks
• Small, robust, wear-free measuring head

• 2D profile measurement
• 3D topography measurement
• Flank measurement
• Structure measurement
• Point measurement
• fast measurement of profile and topography even on very sensitive surfaces
• measurement of fine structures in micro- and nanotechnology
• measurement of thin transparent films
• measurement of step heights, distances or angles in the field of electronics and semiconductors
• evaluation of geometries in micro injection molding
• surface characterization in medical technology and life sciences