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FRT CWL IR - Infrared Film Thickness Sensor

The FRT CWL IR is an interferometric film thickness sensor with an IR light source. The sensor was developed for the thickness measurement of materials
that are transparent in near infrared light. Measurements can be conducted as single point and profile measurements or film thickness mappings of larger areas. Also, the sensor can be used to characterize multilayer film systems. Typical applications are the characterization of semiconductor and sapphire wafers, glass as well as films. Another application is the measurement of adhesive layers between wafers.



FRT CWL IR - Infrared Film Thickness Sensor 



Eigenschaften
   
  • Optical, non-contact,
    non-destructive measurement
  • Measurement with infrared light
  • High local and thickness resolution
  • Excellent signal/noise ratio
  • Small, robust,wear-free measuring head

Datenblatt
 Product Sheet
Hauptprospekt

Company Brochure

 


Typische Anwendungen
 
  • Punctual thickness measurement
  • 2D profile measurement
  • 3D film thickness mapping
  • Thickness measurement of single films and multilayer systems


Technische Daten
 
Model IR 50 IR 250 IR 500 IR 1000
Measuring range film thickness1) 4 – 200 μm 28 – 1100 μm 34 – 1900 μm 60 – 3500 μm
Working distance 39,7 mm
Resolution film thickness1) 15 nm 75 nm 135 nm 250 nm
Resolution x,y 25 μm 6.5 μm
Numerical aperture 0.09
Measuring angle 90° ± 5°
Measuring rate 4,000 measurements / sec. (4 kHz)
Light source Halogen lamp IR superluminescence diode
Repeatability < 0.0002 x measuring range
Operating temperature + 5° C to + 50° C
Dimensions (W x H x D) 260 mm x 115 mm x 310 mm
1) At refractive index of n=1
Scope of Delivery
Measuring head, optical fiber, sensor electronics, operating manual